NanoMaker-Editor Build: Jun ,

NanoMaker-Editor Build: Jun , 2
Publisher: ST Services License: Shareware
Version: 2 Date Added: 13 November, 2008
File Size: 1000.0 KB Downloads: 15
Price: $44.95 Editor Rating:
Systems: Windows2000, Win95, Win98, WinME, WinXP

NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.Trial version of NanoMaker-Editor is limited to number of elements in structure to be exported.Why NanoMaker?NanoMaker provides a unique set of possibilities for nanotechnologies.It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity. Makes simulation of resist development. Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures. Compensates static distortion of e-beam deflecting system. Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection. Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects. Purposes:To convert any scanning electron microscope (SEM) into an e-beam lithograph.To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this: make correction for proximity effect during data preparation for lithographycompensate for the distortion and delays of scanning system during exposure and image acquisitioncompensate for the system drift at prolonged exposure To predict results of lithography by simulating.To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.To create three-dimensional structures in a resist. To familiarize user with the basic principles of lithography.Scanning Electron Microscope controlled byNanoMakerApplications:MicroelectronicsNanotechnology3D nano-micro patterningDiffractive optics (synthetic holograms) for visible and X-ray rangeDigital microscopyEasily installed on:SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...) Focused Ion Beam machines STM/AFM'sSystem Requirements:i486 or Pentium-class processorMicrosoft Windows 98/Me/NT 4.0/2000/XP64 MB of RAM20 MB of available hard-disk spaceFor more information visit our homepage: http://nmaker.ru or http://nanomaker.ru.

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File Size: 1000.0 KB
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